SEMI E109 can be seen as a combination of SEMI E87 (Carrier Management) and SEMI E90 (Substrate Tracking) but dedicated to equipment processing and handling masks/reticles instead of wafers. Mostly this is the case for lithography equipment and reticle stockers. SEMI E109 shares the main principles and concepts with its sibling standards SEMI E87 and SEMI E90, it defines the behavior of the equipment through state model methodology accordingly and specifies object types for pods (mask/reticle carrier), reticles and reticle locations regarding SEMI E39 (Object Services).
Mapping of the services defined by SEMI E109 to the SECS-II protocol is specified in the subordinated document SEMI E109.1.
Would you like to learn more about how you can implement SEMI standards? Send us a message and we will get back to you as soon as possible.

Roman Olwig
Senior Sales Manager
Connectivity, Integration and Rail Automation